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Plasma Strip with Bias Potential

 

Process Probe 2130 Process Probe 2140 Process Probe 2130

Process Probe 2130
(0°C to 130°C)

  • Monitor temperature during strip with plasma on (2130 / 2140 / 2200)

Process Probe 2140
(-60°C to 420°C)

  • Monitor temperature during strip with plasma on (2130 / 2140 / 2200)

Process Probe 2200
(40°C to 119°C)

  • Monitor temperature during strip with plasma on (2130 / 2140 / 2200)

 

Other Processes Supported
2130 LPCVD HOT WALL 2140 APE APTI-ION PS w/BP
RTP   LPCVD/SACVD    
    PS w/BP    
    PVD