Never before has the ability to measure temperature, real-time, in plasma etch systems existed until now. SensArray’s Process Probe 2130 fiber optic instrumented wafers offers unprecedented accuracy and durability than previously possible, thanks to a special design that integrates thermo-fluorescent fiber optic sensors into the wafer. Process Probe wafers may be used in most plasma etch without hardware modifications. A universal fiber optic feed through is available for most etch systems ensuring that vacuum integrity is maintained. Measuring wafer temperatures directly supports the characterization and optimization of plasma uniformity, polymer formation, bombardment balance, backgas pressure uniformity, and many more areas.