SensArray Process Probe 1840 Rev. A instrumented wafers provide accuracy previously unattainable in real time hot plate temperature measurements. With up to 34 RTDs (resistance temperature devices), the 1840 Rev. A can be used in processes ranging from 0°C to 250°C, including photoresist track systems and wafer probers. Directly measure wafer temperature stability and uniformity without dependence on imprecise process monitors or contact temperature sensors. Advanced photolithography processes demand tight control of photoresist bake temperature and temperature uniformity. Great accuracy in the measurement of prober hot plate temperature can yield more good die. By utilizing the Process Probe 1840, you won’t have to rely on temperature measurement guesswork any longer!